Ham-Let, a leading global manufacturer of instrumentation valves and fittings for industrial and high-purity fluid and gas delivery systems, is releasing its new ultra fast (UF) diaphragm valve for atomic layer deposition at Semicon West in San Francisco, during 8-10 July, booth no. 1539.
“Our UF's flow adjustment mechanism allows for exceptional flow tuning during operation,” said Eran Pintel from Ham-Let.
The optional extended bonnet and cooling fin provide a high quality solution when precise and repeatable performance in high-temperature applications is required. The UF series offers advanced sealing performance and durability in hazardous environments, under severe demands of ultra-fast actuation at high purity applications.
"The UF series meets the demand for high-precision diaphragm valves that can perform accurately and repeatedly over an extremely large number of cycles, required by ALD applications,” said Pintel.
HAM-LET will showcase a live demonstration of the UF series at Semicon West 2014.